| سال | هفته | ID | Title | ApplNo | IPC | Applicant | Subgroup | زیر گروه | رشته | شرح | Description |
|---|
2025 | 48 | WO/2025/105309 | SPUTTERING TARGET ASSEMBLY AND FILM | JP2024/039839 | C23C 14/34 | JX ADVANCED METALS CORPORATION | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/105310 | SPUTTERING TARGET ASSEMBLY AND FILM | JP2024/039840 | C23C 14/34 | JX ADVANCED METALS CORPORATION | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/241213 | OPTICAL COATING FOR SHOES AND PREPARATION METHOD THEREFOR | CN2024/096300 | C23C 14/24 | CHEN, Weizhong | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/241220 | PREPARATION METHOD FOR CATHODE INTEGRATED COATING, DEVICE AND ALTIN COATING | CN2024/097004 | C23C 14/06 | GUANGDONG HUASHENG NANOTECHNOLOGY CO., LTD | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/241329 | FLIPPING DEVICE AND COATING APPARATUS | CN2024/112370 | C23C 14/50 | ARRAYED MATERIALS (CHINA) CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/241345 | EVAPORATION BOAT, PREPARATION METHOD THEREFOR, AND USE THEREOF | CN2024/115054 | C23C 14/24 | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/241346 | EVAPORATION BOAT, PREPARATION METHOD THEREFOR AND USE THEREOF | CN2024/115068 | C23C 14/24 | CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/242602 | METHOD OF MONITORING A PVD MACHINE, MONITORING SYSTEM, AND PVD MACHINE SYSTEM | EP2025/063686 | C23C 14/24 | BOBST MANCHESTER LTD | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/242608 | METHOD AND CONTROL SYSTEM FOR CONTROLLING A PHYSICAL VAPOR DEPOSITION MACHINE | EP2025/063707 | C23C 14/24 | BOBST MANCHESTER LTD | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/243104 | HEATING SYSTEM, VACUUM CHAMBER, AND METHOD OF PROCESSING A SUBSTRATE IN A VACUUM CHAMBER | IB2025/053519 | C23C 14/24 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/243191 | METAL SURFACE MODIFICATIONS FOR WEAR AND CORROSION RESISTANT APPLICATIONS | IB2025/055200 | C23C 30/00 | CALLIDUS PROCESS SOLUTIONS PTY LTD | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/243788 | SURFACE-TREATED STEEL MATERIAL | JP2025/016005 | C23C 28/00 | NIPPON STEEL CORPORATION | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/243822 | SPUTTERING DEVICE | JP2025/016594 | C23C 14/34 | JAPAN DISPLAY INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/243840 | MASK AND MANUFACTURING METHOD FOR ORGANIC DEVICE | JP2025/016782 | C23C 14/04 | DAI NIPPON PRINTING CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/243852 | MASK AND METHOD FOR PRODUCING ORGANIC DEVICE | JP2025/016850 | C23C 14/04 | DAI NIPPON PRINTING CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/244142 | MASK, VAPOR DEPOSITION METHOD, AND METHOD FOR PRODUCING DEVICE | JP2025/018976 | C23C 14/04 | DAI NIPPON PRINTING CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/244143 | MASK, MASK DEVICE, AND METHOD FOR PRODUCING MASK DEVICE | JP2025/018978 | C23C 14/04 | DAI NIPPON PRINTING CO., LTD. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/244530 | A METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION ON A SUBSTRATE | NL2025/050239 | C23C 16/40 | SALD IP B.V. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/244592 | ACTIVE HYDROGEN MEASUREMENT SYSTEM WITH PRESSURE DIFFERENCE | TR2024/050532 | C23C 8/24 | TEKNOVAK ENDÜSTRİYEL FIRIN SİSTEMLERİ ANONİM ŞİRKETİ | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/244640 | MAGNETRON SPUTTER CATHODE, METHOD OF OPERATING A MAGNETRON SPUTTER CATHODE, SPUTTER DEPOSITION SOURCE, DEPOSITION APPARATUS, AND METHOD OF OPERATING A SPUTTER DEPOSITION SOURCE | US2024/030736 | C23C 14/35 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/244797 | DURABLE BACKSIDE LAYER OF A SEMICONDUCTOR SUBSTRATE | US2025/026879 | C23C 16/455 | LAM RESEARCH CORPORATION | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/244833 | INHIBITORS FOR SELECTIVE EPITAXIAL DEPOSITION | US2025/028039 | C23C 16/04 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/244852 | REFLECTOR CONFIGURATIONS FOR ENERGY FOCUSING IN PROCESSING CHAMBERS, AND RELATED CHAMBER KITS AND METHODS | US2025/028444 | C23C 16/48 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/245283 | A METHOD OF COATING A SUBSTRATE INCLUDING A MULTI-LAYER COATING | US2025/030451 | C23C 16/44 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/245326 | PECVD SILICON NITRIDE TRENCH BOTTOM PROFILE CONTROL WITH PULSED DUAL RF FREQUENCY PLASMA | US2025/030541 | C23C 16/505 | APPLIED MATERIALS, INC. | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی | 2025 | 48 | WO/2025/245342 | METAL-FLUORIDE THIN FILMS AND DEPOSITION METHODS | US2025/030569 | C23C 16/455 | LOTUS APPLIED TECHNOLOGY, LLC | CHEMISTRY; METALLURGY | علم شیمی؛ متالورژی | متالوژی |